Facilities and Infrastructure

CEPDAM’s state-of-the-art facilities and infrastructure form the backbone of our work. Designed to empower collaboration, they support each of our five research clusters with the tools, labs, and spaces needed to turn ideas into impactful solutions.

  • Additive Manufacturing

    The Formlabs Form 4L is a large-format mSLA resin 3D printer designed for fast, precise production and prototyping. With a generous build volume of 353 × 196 × 350 mm, it enables the efficient fabrication of large projects—often in under six hours—powered by Low Force Display™ technology. The system ensures high accuracy, exceptional part quality, and compatibility with a broad range of materials.

  • Collaborative Robot

    The CRX-5iA is the most compact collaborative robot in Fanuc’s CRX series, offering a 5 kg payload capacity and a 994 mm reach. Its lightweight, space-efficient design makes it ideal for automating tasks in tight workspaces that do not require heavy lifting, while ensuring safe and seamless human–robot collaboration.

  • Immersive Spatial Computing

    It is a hybrid 6DOF headset that supports both standalone and PC-VR modes, offering high-quality visuals and intuitive controls tailored for enterprise applications.

  • Neuroengineering and Neurotechnology

    An EEG acquisition system is the hardware and software setup used to record, process, and store brain activity measured through electroencephalography (EEG).

    Here’s what it usually includes:

    • Electrodes/sensors – placed on the scalp to detect tiny electrical signals generated by neural activity.
    • Amplifiers – boost the very weak brain signals so they can be accurately measured.
    • Analog-to-digital converters – transform the continuous electrical signals into digital data a computer can process.
    • Data acquisition hardware/software – collects, filters, and displays the EEG signals in real time.
    • Storage and analysis tools – allow researchers or clinicians to review, interpret, and analyze brainwave patterns.